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High-Frequency Matchless RF Generator

Application: Plasma generator (ICP and CCP) & wafer bias

Benefits

  • Very low impedance drive direct couples to plasma
  • Matching network not required – reduces complexity
  • No reflected power
  • Highly controllable and precise output. Both pulsed or continuous operation possible
  • Arc and fault protection
  • Fast feedback and control or preprogrammed control possible (< 10 μs)

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Electrical Specifications
  • Output voltage: 0-10 kV
  • Waveform type: bipolar RF
  • Frequency: 15 MHz
  • Peak power: 20 kW
Output Waveforms