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Mid-Frequency Matchless RF Generator

Application: Plasma generator (ICP and CCP) & wafer bias

Benefits

  • Very low impedance drive direct couples to plasma
  • Matching network not required – reduces complexity
  • No reflected power
  • Highly controllable and precise output. Both pulsed or continuous operation possible
  • Arc and fault protection
  • Fast feedback and control or preprogrammed control possible (< 10 μs)

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Electrical Specifications
  • Output voltage: > 25 kV
  • Waveform type: bipolar RF
  • Peak output current: 3 kA
  • Frequency: 100 kHz - 1 MHz
  • Peak power can be > 100 kW
Output Waveforms