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Spartan™: 20 kW Unipolar Pulse Generator

Application: Wafer Bias

Benefits

  • Matching network not required – reduces complexity
  • Improved ion energy distribution control leads to improved etch quality
  • Fast pulse rise time optimizes wafer on-time (time wafer spends at nonzero voltages)
  • Retrofit older processing tools to upgrade capabilities

Click the Tabs Below for More Information

Electrical Specifications
  • Output voltage: 0-14 kV
  • Peak output current: 175 A
  • Max average input power: 20 kW
  • Frequency: 80-600 kHz
  • Peak efficiency: > 80% (load dependent)
  • Controller: TCP/IP or EtherCat® communication

 

Mechanical Specifications
Control and Sensors
Waveform