Tailored Waveform Generators

EHT Semi tailored waveform generators enable precision control of wafer bias to bring new advantages to the semiconductor manufacturing industry.

• More tightly controlled wafer voltages result in narrower ion energy distributions, which allows for increased control over process results including smaller critical dimensions.
• Increased flexibility for multistate or multilevel operation (continuous states with fast transitions between states).
• Fast rise and fall times compared to RF sine-wave generators results in increased etch time per cycle.
• No matching network is required, reducing complexity and size.
• Very broad range of dynamically-adjustable pulse repetition frequencies.

Our tutorial explains how waveform choice affects the ion energy distribution at the wafer surface to help understand the tradeoffs.