Products

EHT Semi power systems are designed for plasma generation and control. Our Orion - Direct RF System eliminates the need for a matching network to provide faster and more reliable plasma ignition and maintain a stable plasma through challenging process transitions. They can be used for ICP, CCP, and bias applications.

Our tailored waveform generators improve ion energy distribution control at the wafer surface for processes that range from ALE/ALD to HAR etching. Our tutorial explains how waveform choice affects the ion energy distribution at the wafer surface to help understand the tradeoffs.

If our standard products do not meet your application needs, contact us to discuss how they can be modified, or a custom solution can be developed, to meet your specifications.