Orion™ - Direct RF System
OrionTM is EHT Semi’s advanced matchless RF power system that directly drives the plasma and eliminates the traditional match box. This system provides efficient and agile power modulation for precision plasma control to enable the next-generation semiconductor manufacturing applications.
Application: Plasma generation (ICP and CCP) & wafer bias
Power: 5 kW
Frequency: 2 or 13.56 MHz
Benefits
- Couples to the plasma without a matching network
- Faster and more reliable plasma ignition than traditional RF generators with a matching network
- Maintains a stable plasma through challenging process transitions (e.g., gas, pressure, and power)
- Enables rapid transitions between power levels
- No reflected power
- Compact enough to replace matching network on tool
